Targets of BaTiO 3 (BT) (50 mm diameter) were prepared starting from BT-commercial powders (99.9%) and particle size of 2 µm, previously dry milled by high energy process (SPEX 8000 mixer mill). The ...
Abstract: This paper reports on the parameters that affect the crystalline quality of Aluminium Nitride (AlN) thin film grown using the RF magnetron sputtering process. AlN film of 1-micron thickness ...
Abstract: Rf magnetron discharges offer a number of advantages for the sputtering technology, such as the ability to be used for a virtually arbitrary target type. From the theoretical point of view, ...
Dublin, July 15, 2025 (GLOBE NEWSWIRE) -- The "Magnetron Sputter Film Market Outlook 2025-2034: Market Share, and Growth Analysis By Product Type (Metal Films, Alloy Films, Dielectric Films), By ...
Magnetron sputter deposition of metal targets over liquids allows producing colloidal solutions of small metal nanoparticles (NPs) without any additional reducing or stabilizing reagents. Despite that ...
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